
In the fields of thin film deposition and semiconductor manufacturing, the choice of target material plays a crucial role in process stability and product quality. Titanium and tungsten targets, as two commonly used sputtering materials, each offer distinct advantages in different application scenarios due to their unique physical and chemical properties. Titanium targets, with their excellent corrosion resistance and biocompatibility, are widely used in the thin film preparation for medical, aerospace, and industrial coatings. Titanium can form a stable oxide…